专利名称：STABILIZED SLURRY COMPOSITIONS发明人：MISRA, ASHUTOSH申请号：US9928087申请日：19991124公开号：WO0032713A9公开日：20020822
摘要：Provided are slurry compositions suitable for use in a chemical-mechanicalplanarization process and methods for making same. The compositions include: (a)abrasive particles dispersed in a suspension medium; (b) a peroxygen compound; and (c) astabilizing agent. The stabilizing agent includes a phosphoric acid, a salt of a phosphoricacid or combinations thereof. The invention has particular applicability to thesemiconductor manufacturing industry.
申请人：AIR LIQUIDE AMERICA CORPORATION,MISRA, ASHUTOSH
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