Detection of thin lines for selective sensitivity

专利名称：Detection of thin lines for selective

sensitivity during reticle inspection usingprocessed images

发明人：Zhengyu Wang,Rui-fang Shi,Lih-Huah

Yiin,Bing Li

申请号：US144700申请日：20140902公开号：US09092847B2公开日：20150728

专利附图：

摘要：A detection method for a spot image based thin line detection is disclosed. The

method includes a step for constructing a band limited spot image from a transmittedand reflected optical image of the mask. The spot image is calibrated to reduce noiseintroduced by the one or more inspection systems. Based on the band limited spotimage, a non-printable feature map is generated for the non-printable features and aprintable feature map is generated for the printable features. One or more test imagesof the mask are analyzed to detect defects on such mask. A sensitivity level of defectdetection is reduced in areas of the one or more test images defined by the non-printable feature map, as compared with areas of the one or more test images that arenot defined by the non-printable features map

申请人：KLA-Tencor Corporation

地址：Milpitas CA US

国籍：US

代理机构：Kwan & Olynick LLP

更多信息请下载全文后查看