METHOD OF PREPARING GRAPHENE LAYER

专利名称：METHOD OF PREPARING GRAPHENE LAYER发明人：Kun-Ping HUANG,Chih-Chen CHANG,Yu-Tse

HSIEH,Po-Wen Chiu,Henry Medina

申请号：US13613755申请日：20120913

公开号：US20130168229A1公开日：20130704

专利附图：

摘要：Disclosed is a method of forming a graphene layer, including: putting asubstrate in a chamber of an electron cyclotron resonance device, and then vacuumingthe chamber. Conducting a carbon-containing gas into the chamber, wherein the carbon-

containing gas has a pressure of 10torr to 10torr in the chamber. Heating the substrateuntil the substrate has a temperature of 100° C. to 600° C., and using a microwave with anelectron cyclotron resonance mechanism to excite the carbon-containing gas to deposit agraphene layer on the substrate.

申请人：Kun-Ping HUANG,Chih-Chen CHANG,Yu-Tse HSIEH,Po-Wen Chiu,Henry Medina

地址：Miaoli County TW,New Taipei City TW,Taoyuan County TW,Hsinchu CityTW,Hsinchu City TW

国籍：TW,TW,TW,TW,TW

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