MICROCHIP AND PROCESS FOR PRODUCING MICROCHIP

专利名称：MICROCHIP AND PROCESS FOR

PRODUCING MICROCHIP

发明人：HIRAYAMA, Hiroshi申请号：EP07831715.3申请日：20071113公开号：EP2105744A1公开日：20090930

专利附图：

摘要：An objective is to provide a microchip capable of preventing leakage of areagent or the like by filling in the space between substrates in the vicinity of an openingportion formed in a microchip. Therefore, a microchip is fitted with microchip substrate 10

and microchip substrate 14. Microchip substrate 10 possesses fine flow path 11 in theform of a groove, and a through-hole, and microchip substrate 10 and microchipsubstrate 14 are attached to each other to prepare a microchip. Opening portion 12 isconnected to fine flow path 11, and the reagent or the like is introduced or dischargedvia opening portion 12. Dielectric film 13 is formed on the inner surface of openingportion 12. an SiO2 film or a TiO2 film is employed as dielectric film 13.

申请人：Konica Minolta Opto, Inc.

地址：2970 Ishikawa-machi Hachioji-shi, Tokyo 192-8505 JP

国籍：JP

代理机构：Henkel, Feiler & Hänzel

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