METHOD AND APPARATUS FOR ELECTRON BEAM ALIGNMENT W

专利名称：METHOD AND APPARATUS FOR ELECTRON

BEAM ALIGNMENT WITH A MEMBER BYDETECTING CATHODOLUMINESCENCEFROM OXIDE LAYERS

发明人：O KEEFFE T,US申请号：US40224973申请日：19731001公开号：US3832560A公开日：19740827

摘要：A method and apparatus are provided for alignment of an electron beam withprecisely located areas of a major surface of a semiconductor member. At least one andpreferably two spaced apart detector marks of predetermined shape formed bycathodoluminescent oxide layers are positioned adjacent the major surface. Eachdetector mark provides a differential in cathodoluminescence projected by the oxidelayer corresponding to the area of the mark irradiated by an electron beam. To align, anelectron beam to be aligned has at least one alignment beam portion corresponding toat least one detector mark and of predetermined cross-sectional shape. The alignmentbeam portions are projected onto the major surface of the member in the vicinity of thecorresponding detector marks. And the cathodoluminescence generated by the oxidelayers in at least the vicinity of the detector mark is detected by detecting means. Theelectron beam is moved relative to the member while continuing said detection until thedetected cathodoluminescence indicates optimum alignment of each alignment beamportion thereof with a corresponding detector mark. Preferably, said alignment method

is used in producing a very accurate component pattern in electroresist layer on themajor surface of the member with either a scanning electron beam or a patternedelectron beam generated by a photocathode source.

申请人：WESTINGHOUSE ELECTRIC CORP,US

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