专利名称:SYSTEM AND METHOD FOR PRODUCING
AND USING MULTIPLE ELECTRON BEAMSWITH QUANTIZED ORBITAL ANGULARMOMENTUM IN AN ELECTRONMICROSCOPE
发明人:Benjamin McMorran申请号:US13372914申请日:20120214
公开号:US20120153144A1公开日:20120621
专利附图:
摘要:A system and method for using electron beams with engineered phasedislocations as scanned probes in electron probe beam instruments such as scanningtransmission electron microscopes. These types of electron beams have uniqueproperties and can provide better information about a specimen than conventionalelectron beams. Phase dislocations may be created based on a pattern disposed on ananoscale hologram, which may be placed in the electron optical column of the electronprobe beam instrument. When an electron beam from the instrument is directed ontothe hologram, phase dislocations may be imprinted onto the electron beam whenelectrons are diffracted from these holograms. For example, electron probe beams withspiral phase dislocations may occur. These spiral phase dislocations are formed using ahologram with a fork-patterned grating. Spiral phase dislocations may be used to providemagnetic contrast images of a specimen.
申请人:Benjamin McMorran
地址:US
国籍:US
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