Masks

专利名称：Masks发明人：Simon Lau申请号：US10150537申请日：20020517

公开号：US20020192572A1公开日：20021219

专利附图：

摘要：Printing, marking or etching a surface is achieved using a mask or masks incombination with electromagnetic radiation (such as a laser or the like) or otherwiseexposing one or more selected areas of a surface for treatment, utilising transmissive,non-transmissive or modified transmissivity portions of one or more layers of material of

the mask. In one embodiment a surface of a first radiation transmissive layer of the maskis partially covered by a second layer of material which is substantially non-transmissiveto radiation. An uncovered portion of the transmissive layer is in the shape of an element(such as a character, symbol or shape) to be printed, marked, etched or the like on thesurface.

申请人：LAU SIMON

更多信息请下载全文后查看